subjects for day 1:
Nanofabrication (lithography - projection, proximity, e-beam, ion, projection ion, projection e-beam, interference lithography, etc -, etching techniques, deposition techniques - MBE, CVD, sputtering, evaporation, ebeam-evap, etc - , equipment specifications and use, self-assembly, 'soft'-lithography, etcetcetc)
Characterization techniques (AFM, STM, SNOM, MFM, EFM, SSRM, SCM, TEM, SEM, STEM, X-ray spectroscopy, diffraction, etc)
ya, as the title says.
and yea, day 2 is friday.